WIN

Chemical compositions used for planarizing the surface portion of metals, namely, aluminum, copper, tungsten carbide, stainless steel, cobalt chrome, and other metals; Chemical compositions used for planarizing the surface portion of glass, namely, optical substrates, fused silica, sapphire, borosilicate, borosilicate glass, polysilicon, and other translucent glass materials; Chemical compositions used for planarizing the surface portion of ceramics, namely, aluminum oxide and aluminum oxynitride; Chemical compositions used for polishing, planarizing or smoothing the surface portion of semiconductors substrates, namely, aluminum nitride, gallium nitride, indium phosphide, indium gallium phosphide, silicon carbide, and sapphire; and Chemical compositions used for planarizing the surface portion of other types of materials, namely, polymers, pure and co-polymers, architectural stones, and gemstones

Chemical compositions used for polishing or smoothing the surface portion of metals, namely, aluminum, copper, tungsten carbide, stainless steel, cobalt chrome, and other metals; Chemical compositions used for polishing or smoothing the surface portion of glass, namely, optical substrates, fused silica, sapphire, borosilicate, borosilicate glass, polysilicon, and other translucent glass materials; Chemical compositions used for polishing or smoothing the surface portion of ceramics, namely, aluminum oxide and aluminum oxynitride; and Chemical compositions used for polishing or smoothing the surface portion of other types of materials, namely, polymers, pure and co-polymers, architectural stones, and gemstones