VISIBLE EDGE

Semiconductor manufacturing machines; plating apparatus for manufacturing semiconductors; electric cleaning apparatus for manufacturing semiconductors; semiconductor manufacturing machines and apparatus and their parts; electric cleaning apparatus for use in manufacturing semiconductor substrates [parts of machines]; electric semiconductor wafer cleaning apparatus for use in the manufacture of semiconductors; electroplating machines; plating apparatus; liquid tanks for use in processing plating [parts of machines].

Measuring or testing machines and instruments; apparatus for automatically measuring plating solution concentration; machines and apparatus for automatically adjusting component concentration, pH value and replenishment amount of plating solution; apparatus for measuring film thickness on the substrate during plating in real time, and controlling the film by partial mask that covers (part of) the periphery of the substrate for a predetermined time, thereby enhancing the uniformity of the plating film.