79120311
Aug 22, 2012
Apparatus and instruments in the field of plasma technology and semiconductor processing, plasma sources, sources for generating plasma, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and other materials, scientific instruments used to etch silicon and other materials, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via very high frequency electrode excitation; plasma research apparatus and instruments, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and other materials, scientific instruments used to etch silicon and other materials; plasma cluster tools, namely, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods; structural parts and fittings for all the aforesaid goods
Electrical and Scientific Apparatus