ULTRATECH

photolithographic machines for manufacturing semiconductor wafers and other substrates; reticles and masks for use with said photolithographic machines in manufacturing said semiconductor wafers and other substrates, wherein said reticles and masks contain the pattern to be printed on said semiconductor wafer and other substrates; specialized optical lenses, wafer, reticle and mask transport stages and wafer index tooling for use in manufacturing semiconductor wafers and other substrates; computer software for use in operating photolithographic machines for manufacturing semiconductor wafers and other substrates; and replacement parts and consumable materials for the aforesaid goods

operation, instruction and training manuals, and printed forms for use with photolithographic machines for manufacturing semiconductor wafers and other substrates, specialized optical lenses, wafer, reticle and mask transport stages and wafer index tooling for use in manufacturing semiconductor wafers and other substrates, and computer software for use in operating photolithographic machines for manufacturing semiconductor wafers and other substrates

repair services for photolithographic machines for manufacturing semiconductor wafers and other substrates, specialized optical lenses, wafer, reticle and mask transport stages and wafer index tooling for use in manufacturing semiconductor wafers and other substrates

educational services, namely, conducting training courses in the use of photolithographic machines for manufacturing semiconductor wafers and other substrates, reticles and masks for use with said photolithographic machines in manufacturing said semiconductor wafers and other substrates, specialized optical lenses, wafer, reticle and mask transport stages and wafer index tooling for use in manufacturing semiconductor wafers and other substrates, and computer software for use in operating photolithographic machines for manufacturing semiconductor wafers and other substrates