TOK

Anti-reflective coatings used with photoresists in the lithography process for use in the manufacture of semiconductor and liquid crystal displays; Coating solutions for forming insulator films and for diffusing impurities in the manufacture of semiconductor and liquid crystal displays; Dry film photoresists, namely, photosensitive dry films for use in the manufacture of printed circuits and flat panel displays; Materials for use in the manufacture of cathode-ray tubes, namely, photoresists for use in the manufacture of shadow masks, and adhesives; Chemicals for photoresists, namely, rinsing solution and stripping solution

Plasma processing apparatus for etching and ashing for use in the manufacture of semiconductor and liquid displays; Photosensitive printing materials, namely, photopolymer printing plates