87064839
Jun 8, 2016
Nov 28, 2017
Active Trademark
Silane gas, dichlorosilane gas, disilane gas, nitrogen trifluoride gas, and tungsten hexafluoride gas for processing semiconductors; detergents for industrial use; detergents for use in manufacturing processes; etchants for use in the manufacture of semiconductors; detergents for industrial use as part of manufacturing operations; perfluorinated chemical compounds prepared synthetically for use in manufacture; silanes for the manufacture of semiconductor and solar batteries; chemical source material for the deposition of thin films upon semiconductor wafers for the manufacture of semiconductors; chemicals for use in the manufacture of solar cells; chlorides, namely, dichlorosilane; chlorofluorocarbons; carbon fluorochloride; etching mordants being acids; caustics for industrial purposes; corrosive chemical preparations for use in industry; acids, namely, dichlorosilane, tungsten hexafluoride; inorganic acid
Chemicals