79248670
Feb 5, 2018
Etching machines; plasma etching machines; plasma or reactive ion etching apparatus; apparatus for etching substrates; platforms for etching and deposition apparatus; apparatus for etching semiconductor material; apparatus for use in the treatment of semiconductor materials; apparatus for use in the fabrication of semiconductor devices; apparatus for chemical deposition; sputtering apparatus; evaporation apparatus; plating apparatus; vacuum chambers; pumps; valves; apparatus for handling and storing semiconductor wafers; semiconductor processing machines for etching semiconductor wafers; semiconductor, MEMS and thin film fabrication machines including plasma generators; parts and fittings for all the aforesaid goods; all included in this class; apparatus for the treatment, processing or manufacture of semi-conductor wafers; metal and chemical vapour deposition apparatus for use in development and production of semiconductor devices
MachineryTesting, measuring and analysing apparatus, instruments and devices; measuring apparatus and instruments; end point detectors; all for use with etching apparatus; metal and chemical vapour deposition apparatus for use in research of semiconductor devices; computer software and hardware; parts and fittings therefor all included in this class
Electrical and Scientific Apparatus