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Photosensitive or Non-Photosensitive Chemicals-Namely, Photosensitive Resin Solution, Developer, Finishing Solution, Etching Solution, Gumming Solution and Pre-Bake Solution Used in Printing; Solutions for a Resist Material for Forming Micro-Image in Devices Such as IC's, LSI's, VLSI's, Surface Acoustic Wave Elements, Bubble Memories, and for Producing Mother Mask for Photolithography, X-Ray Lithography, and Deep Ultraviolet Lithography, and for Producing Microfilm Images, Video Tape Recording Images, and Video Disc Recording Images; and Chemicals-Namely, Developer, Rinsing Solution, Removing Solution and Finishing Solution Used for Treating Semi-Conductive Inorganic Substrates, Metal Substrates, Plastic Substrates or Resin Substrates