S 1ST SILICON

MASKING COMPONENTS FOR USE IN THE MANUFACTURE OF SEMICONDUCTORS, NAMELY, PHOTOMASKS USED FOR FORMATION OF SEMI-CONDUCTOR INTEGRATED CIRCUITS; INTEGRATED CIRCUITS, INTEGRATED CIRCUIT MEMORIES, SEMICONDUCTOR CHIPS, SEMICONDUCTOR ELECTRONIC CHIPS FOR THE MANUFACTURE OF INTEGRATED CIRCUITS, SEMICONDUCTOR ELEMENTS, SEMICONDUCTOR WAFERS, SILICON WAFERS, SEMICONDUCTORS, DISCRETE SEMICONDUCTOR DEVICES, SEMICONDUCTORS BEING ELECTRONIC DEVICES, LEAD FRAMES USED IN MANUFACTURING SEMICONDUCTORS

SEMICONDUCTOR AND INTEGRATED CIRCUIT FOUNDRY SERVICES, NAMELY, THE ASSEMBLY OF SEMICONDUCTORS FOR OTHERS, CUSTOMIZED MANUFACTURE OF SEMICONDUCTORS, SEMICONDUCTOR DEVICES, INTEGRATED CIRCUITS, INTEGRATED CIRCUIT MEMORIES, SEMICONDUCTOR MEMORIES, SEMICONDUCTOR CHIPS, ELECTRONIC CHIPS, SEMICONDUCTOR ELEMENTS, SEMICONDUCTOR WAFERS AND SILICON WAFERS TO THE SPECIFICATIONS OF OTHERS

SCIENTIFIC RESEARCH; DESIGN FOR OTHERS IN THE FIELD OF INTEGRATED CIRCUITS; INDUSTRIAL ANALYSIS AND RESEARCH SERVICES, NAMELY, RESEARCH IN THE AREA OF SEMICONDUCTOR PROCESSING TECHNOLOGY; DEVELOPMENT, DESIGN AND TESTING OF SEMICONDUCTORS, INTEGRATED CIRCUITS, SEMICONDUCTOR DEVICES AND SEMICONDUCTOR ELEMENTS AND PROVIDING INFORMATION THEREON; TECHNICAL CONSULTANCY IN RELATION TO THE PRODUCTION OF SEMICONDUCTORS