REMOTE PLASMA ANNEAL

SEMICONDUCTOR WAFER PROCESSING EQUIPMENT, AND COMPONENTS, NAMELY-- EPITAXIAL REACTORS, CHEMICAL VAPOR DEPOSITION REACTORS, PHYSICAL VAPOR DEPOSITION REACTORS, PLASMA ETCHERS, ION IMPLANTERS, CHEMICAL MECHANICAL POLISHERS, SUPPORTING FRAMES THEREFOR, AND PARTS THEREFOR; AND COMPUTER OPERATING PROGRAMS FOR USE THEREWITH