77247009
Aug 3, 2007
Chemicals for use in selective electroless metal deposition process for cladding of copper interconnects for integrated circuits, integrated circuit substrates, solar cells, flat panel displays, multi-chip modules, micro-electromechanical systems; chemicals for use in photo-selective metal deposition process to fabricate metal patterns in the manufacture of semiconductor and electronic devices; precision analytical chemicals for use in analysis of chemicals in selective electroless metal process
Chemicals