REACTAFLO

process and test equipment and electrical and electronic control apparatus and instruments; namely, apparatus for vacuum process wafer fabrication; vacuum and plasma process and control equipment and instruments, power supplies and controllers for plasma processing; controllers for plasma etching and deposition, low pressure vapor chemical deposition, metal organic chemical vapor deposition, sputtering; micro processor based computer compatible apparatus for the above; and process automation apparatuses for vacuum apparatuses and processes comprising deposition, etching and metal organic vapor deposition