PHOENIX

Atomic layer deposition systems for a variety of coating applications, namely, gate dielectrics, gate electrodes, metal interconnects, diffusion barriers, DRAM, multilayer-capacitors, read heads, antireflection, optical filters, OLED layers, photonic crystals, transparent conductors, electroluminescence, solar cells, lasers, integrated optics, MEMS, etch resistance, hydrophobic / antistiction, blade edges, molds and dies, solid lubricants, anti corrosion, inside pores, nanotubes, around particles AFM tips, chemicals, catalysis, fuel cells, roll to roll, internal tube liners, nano-glue, biocompatible, and magnetics, among others; semiconductor wafer processing machines; deposition systems comprised in part of a reaction chamber, precursor lines, and a cabinet for coating