I

Photoresists in the nature of chemicals; solutions of chemicals useful to form metal oxide thin films; solutions of chemicals for deposition of metal oxide thin films for use as hard mask layers; metal oxides for use in a photoresist process, namely, solutions of metal oxides; developers, namely, photoresist developers for use with photoresists in the nature of chemicals; underlayer materials in the nature of chemicals, namely, chemical compositions for use with photoresist patterning