HYPER NA ISI

Components of optical instruments for use in the semiconductor industry, namely, apparatus comprised of computer software for use in analyzing data received from an overlay metrology tool and lenses focused on openings in an aperture plate with an intervening patterned chrome face, in the same form factor as a standard reticle for use in exposing photographically prepared patterns in projection imaging systems that potentially operate at numerical apertures above one, and reconstructed lens aberrations that are used for sharpening the image at the surfaces of wafers for use in manufacturing of integrated circuits