HOTOZONE

SEMICONDUCTOR WAFER PROCESSING APPARATUS, AND PARTS THEREOF, USED IN SEMICONDUCTOR DEVICE MANUFACTURING FOR PHOTORESIST STRIPPING, ETCHING, SURFACE CLEANING, OR SURFACE TREATMENT OF SEMICONDUCTOR WAFERS AND FLAT PANEL DISPLAY SUBSTRATES, FOR OZONE-BASED CLEANING, PROCESSING, AND SURFACE TREATMENT OF MATERIALS AND DEVICES

ENGINEERING SERVICES AND ENGINEERING CONSULTING SERVICES RELATING TO INSTRUMENTS, EQUIPMENT, COMPONENTS, AND PROCESSES FOR OZONE-BASED AQUEOUS CLEANING, PROCESSING, AND SURFACE TREATMENT OF MATERIALS AND DEVICES