HIGH ACCURACY SOURCE METROLOGY INSTRUMENT (HA-SMI).

Components of optical instruments for use in the semiconductor industry, namely, apparatus comprised of computer software for use in analyzing data received from an image capture tool and an in-situ imaging objective with mounting means attached to a framework in the same form factor as a standard reticle for use in exposing photographically prepared patterns and images that are used for measuring and aiming to the sufraces of wafers for use in manufacturing of integrated circuits