FEI

high brightness, submicron ion and electron beam columns using field emission technology, namely, focused ion beam columns for ion lithography, ion beam milling, secondary ion mass spectroscopy, focused electron beam columns for electron beam lithography, and electron beam microscopy; single crystal source materials, namely, refractory metals, LaB6 mini-vogel cathodes, CeB6 mini-vogel mount cathodes, control grid electrodes, namely, rebuilt wehnelts; cold field emitters, schottky emitters, and liquid metal ion sources