FEI

high brightness, submicron focused ion and electron beam systems using field emission technology; namely, for ion beam micromachining, ion milling, ion lithography, ion microscopes, secondary ion mass spectroscopy, electron microscopes and combined ion beam milling/electron microscope systems; high brightness, submicron ion and electron beam columns using field emission technology; namely, ion beam columns for ion lithography, ion beam milling, secondary ion mass spectroscopy, electron beam lithography, and electron beam microscopy; single crystal source materials; namely, refractory metals, LaB6 Mini-Vogel Mount cathodes, cold field emitters, Schottky emitters, and liquid metal ion sources