EXTREME LITHOGRAPHY

Software for electron beam writing and process technology, in particular for simulation and optimization of high resolution electron beam writing and of nanometer process technologies; master substrates for high resolution and ultra-high resolution replication technologies; measurement standard devices for nanometrology, namely measuring tools having a pattern in the micrometer or nanometer ranges

Custom manufacturing for others of structures having dimensions between 5mm and 250nm, namely, semiconductor, superconductors, molecular aggregates, polymer structures and metals

Services in the field of electron beam writing, namely, research, development, consulting and customized services provided for others via focused electrons relating to solid state substrates, for example, silicon (Si), gallium arsenide (GaAs), indium phosphide (InP), silicon carbide (SiC), gallium nitride (GaN) and diamond; services in the field of process technology, namely, research, development and consulting services provided for others relating to structures between 5nm and 250nm; development for others and technical support services, namely, troubleshooting of computer software problems, all in the fields of electron beam writing and process technology, in particular for simulation and optimization of high resolution electron beam writing and of nanometer process technologies