Classification Information
Power supplies; Power supplies for plasma generator; Power supplies for plasma generator for plasma etching and deposition; Power supplies for use in semiconductor processing; Radio frequency power supplies for plasma generator; Radio frequency (RF) generators for supplying radio-frequency energy; Radio frequency (RF) generators for use in plasma etching and deposition; Radio frequency (RF) generators for use in semiconductor processing; Electrical power control for apparatus for conducting, regulating, and controlling RF power delivered to plasma sources; Power supply for inductively coupled plasma (ICP) and capacitively coupled plasma (CCP) generators; Equipment for supplying RF power for semiconductor processing
Electrical and Scientific Apparatus