Chemicals for use in lithography; Chemical preparations for use in processing photosensitive material; Developers for positive type photoresist; Liquid photoimagable compositions; Photosensitive materials [chemicals]; Lithographic chemicals; Chemical compositions and materials for use in science; Chemicals for use in the semiconductor industry; Chemical preparations for use in industry; Chemicals for use in industry and science; Chemicals used in the manufacture of semiconductor chips; Chemical source material for the deposition of thin films upon semiconductor wafers for the manufacture of semiconductors; Chemical reagents for use in industry; Chemical compounds for use in the manufacture of polymers; Fluorspar compounds; Fluorinated polymers; Photoinitiators for the polymerization of artificial resins; Photocatalyst; Resists of light sensitive resins; Industrial organic chemicals; Catalysts for use in the manufacture of polymers; Organic acids for industrial use; Polymerisation catalysts; Salts [chemical preparations]; Perfluorinated chemical compounds prepared synthetically for use in manufacture; Compositions for use in radiation; Salts for industrial purposes; Curing agent for synthetic resin; Chemical substances, chemical materials and chemical preparations, and natural elements.
Chemicals