90581990
Mar 16, 2021
Sep 13, 2022
Active Trademark
Polishing pads for polishing machines for use in the manufacture of integrated circuit wafers, semiconductor wafers, integrated circuits, hard disk drives and chipsets; Non-abrasive polishing pads for chemical-mechanical planarizing or chemical mechanical polishing (cmp) machines for use in the manufacture of integrated circuit wafers, semiconductor wafers, integrated circuits, hard disk drives and chipsets
Machinery