ENVOSYS

Installations consisting of machines for processing semiconductors, in particular for processing semiconductors under vacuum; installations for conveying semiconductors, the installations consisting of appliances for conveying goods; installations and systems for the surface treatment of semiconductors, the installations and systems consisting of machines for processing semiconductors; installations and systems for etching semiconductor surfaces, the installations and systems consisting of machines for processing semiconductors; installations for vaporising semiconductor surfaces, in particular under vacuum (CVD processes), the installations consisting of machines for processing semiconductors; installations consisting of machines for providing semiconductors, namely, automatic feeding devices, automatic loading and unloading facilities and facilities for inserting semiconductors; installations consisting of machines for conveying or processing of photoelectric elements; installations consisting of machines for providing photoelectric elements, namely, automatic feeding devices, automatic loading and unloading facilities for inserting photoelectric elements; installations consisting of machines for conveying or processing flat screens; installations consisting of machines for providing flat screens, namely, automatic feeding devices, automatic loading and unloading facilities and facilities for inserting flat screens

Hardware and software for controlling the operation of systems and installations for the thermal treatment of surfaces and objects, or for automated thermal processes for modifying surfaces, in particular semiconductor surfaces, including hardware and software for controlling the operation of diffusion furnaces, continuous furnaces, installations for vaporising semiconductor surfaces, burn-in ovens, vacuum furnaces; hardware and software for controlling the operation of systems and installations for cleaning gases and exhaust gases, including flue gas purification equipment

Systems and installations for thermal pre-treatment processes or manufacturing processes, namely, diffusion furnaces, continuous furnaces, coating ovens, burn-in ovens, vacuum furnaces; installations consisting of separators for the cleaning and purification of gases for chemical vapour deposition, in particular under vacuum conditions (CVD processes); installations for processing and cleaning gases and exhaust gases; facilities for emitting exhaust gases into the environment, the facilities consisting of flues and installations for emitting exhaust gases to the environment; gas flares; sewage purification installations; sewage purification apparatus; sewage disposal installations