79017726
May 23, 2005
Oct 23, 2007
Mask less lithography machines for the production of integrated circuits, semi-conductors, magnetic domain memories and integral optical systems, namely memory boards and optical character readers
MachineryComputer software for writing and processing technology in electron beams and for simulating and optimizing high-resolution electron beam writing and nanometer process technologies; apparatus and instruments to be used by industries in the fields of electronics and lithography namely, mask less lithography machines (wafer steppers); electronic semiconductors; electronic integrated circuits; magnetic domain memories and integrated optical systems, namely, memory boards and optical character readers and parts and fittings therefore; computer memories for domains; computer software for design, testing and fabrication of photographic masks; semi-conductor memories; integrated circuit module; computer software for designing photo-lithographic masks; magnetic head cleaners; computer chips; DNA chips; LCD large-screen displays; flat panel display screens; magnetic memories, namely, electronic memories; integrated optical systems comprised of blank optical disks, optical disk drives and optical cables
Electrical and Scientific ApparatusScientific research and development in the field of electronic beam writing; technological consultation in the field of electronic beam writing; development of computer software for electron beam writing and process technology for simulating and optimizing high resolution electron beam writing and nanometer process technologies; technological consultation in the field of machines, apparatuses, and instruments for use in the electronics, micro lithography, semi-conductor, integrated circuit, magnetic domain memories and integrated optical systems industries; design, maintenance and development of computer software for use in electronics, micro lithography, semi-conductor, integrated circuit, magnetic domain memories and integrated optical systems industries and for design, testing and fabrication of photo-lithographic masks; technological consultation in the field design, testing and fabrication of photo-lithographic masks
Computer and Scientific