DEFINITY

Power equipment, namely, pattern generators, etch tools, inspection tools, metrology tools, repair tools, and photoresists, used for the manufacture of photomasks, the optical transfer of integrated circuit images onto semiconductor wafers, and for altering and blocking light as applied to photomasks

Clear substrates, namely, glass or quartz, imaged with device layers for exposing silicon substrates; quartz or glass substrates imaged with microscopic structures in the manufacture of intergrated circuits, micro-electrical mechanical structures (MEMS), optical components and systems

[Customer] *Custom* manufacturing at the order and specification of others, namely, photoresist and etch services, for the manufacture of photomasks; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for the optical transfer of integrated circuit images onto semiconductor wafers; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for altering and blocking light as applied to photomasks

Photolithography for the transfer of integrated circuit images onto various substrates, namely, semiconductor wafers, GaAs wafers, III-V compound wafers, quartz, and glass