CORAMIC

silicon carbide and graphite composite materials all for industrial purposes for use in the fields of epitaxy, MOCVD, and the fabrication of semiconductors; graphite and graphite substrates for industrial use in the fields of epitaxy, MOCVD, and the fabrication of semiconductors, all the aforesaid goods also being coated with a protective layer to reduce migration of metals

parts for semiconductor industry, namely, susceptors for epitaxial process made from isostatic graphite material; parts for semiconductor industry, namely, susceptors for epitaxial process made from silicon carbide coated material; parts for semiconductor industry, namely, susceptors made of graphite, silicon carbide reinforced carbon fibers, carbon reinforced carbon, graphite, silicon carbide, felt material, and products, namely, wafer carriers made of silicon carbide for use in MOCVD-industry; all the aforesaid goods also being coated with a protective layer to reduce migration of metals, and all of the aforesaid goods for use in the fields of epitaxy, MOCVD, and the fabrication of semiconductors