CONTINUOUS LITHOGRAPHY

Heat treating, cleaning, etching, implanting and leveling machines, and replacement parts thereof, for use in the production of semiconductors; special tooling for the aforesaid goods; and manuals and software sold as a unit with the aforesaid goods

Stepper, photolithographic and implanting machines for producing images, and printing or implanting images on wafers and other substrates; electron-beam columns and systems; reticles and masks wherein said reticles and masks contain the pattern to be printed on said semiconductor wafer and other substrates, illumination, inspection and measurement apparatus, specialized optical lenses, transport stages for wafers, retides and masks, wafer index tooling, illumination, inspection and measurement apparatus, special tooling, software and manuals all for the aforesaid goods; all for use in manufacturing semiconductor wafers and other substrates

Operation, instruction, maintenance, repair and training manuals and workbooks, and printed forms, all for use with stepper, photolithographic, illumination, inspection and measurement apparatus, heat treating, cleaning, etching, implanting and leveling machines, electron-beam columns and systems, reticles and masks, specialized optical lenses, wafer, reticle and mask transport stages and wafer index tooling for use in manufacturing semiconductor wafers and other substrates

repair and maintenance services for stepper, photolithographic, illumination, inspection and measurement apparatus, heat treating, cleaning, etching, implanting and leveling machines, electron-beam columns and systems, reticles and masks, specialized optical lenses, wafer, reticle and mask transport stages and wafer index tooling for use in manufacturing semiconductor wafers and other substrates

educational and training services, namely conducting courses in the use, operation, maintenance and repair of stepper, photolithographic, illumination, inspection and measurement apparatus, heat treating, cleaning, etching, implanting and leveling machines, electron-beam columns and systems, reticles and masks, specialized optical lenses, wafer, reticle and mask transport stages and wafer index tooling for use in manufacturing semiconductor wafers and other substrates for manufacturing semiconductor wafers and other substrates; and distribution of instructional course materials in connection therewith,