CMPLICITY

Chemicals for use in chemical mechanical polishing and planarization processes in the manufacture of semiconductor and microelectronic products

Chemical mechanical polishing and planarization preparations for use in chemical mechanical polishing and planarization processes in the manufacture of semiconductor and microelectronic products

Process equipment for coupling to semiconductor manufacturing machines and semiconductor wafer processing equipment, namely, metal fluid storage tanks for holding chemical mechanical polishing and planarization compositions, and for holding post-chemical mechanical polishing and planarization cleaning compositions, for machines performing chemical mechanical polishing and planarization processes and for machines performing post-chemical mechanical polishing and planarization processes in the manufacture of semiconductor and microelectronic products

Process equipment for coupling to semiconductor manufacturing machines and semiconductor wafer processing equipment, namely, mixing machines for blending, mixing and delivering chemicals and chemical mechanical polishing and planarization compositions to machines performing chemical mechanical polishing and planarization processes in the manufacture of semiconductor and microelectronic products; and mixing machines for blending, mixing, and delivering chemicals and post-chemical mechanical polishing and planarization cleaning compositions to machines performing post-chemical mechanical polishing and planarization processes in the manufacture of semiconductor and microelectronic products

Process equipment for coupling to semiconductor manufacturing machines and semiconductor wafer processing equipment, namely, dispensers for delivering metered or measured amounts of chemical mechanical polishing and planarization compositions and post-chemical mechanical polishing and planarization cleaning compositions to machines performing chemical mechanical polishing and planarization processes and machines performing post-chemical mechanical polishing and planarization processes in the manufacture of semiconductor and microelectronic products

Process equipment for coupling to semiconductor manufacturing machines and semiconductor wafer processing equipment, namely, plastic fluid storage tanks for holding chemical mechanical polishing and planarization compositions, and for holding post-chemical mechanical polishing and planarization cleaning compositions, for machines performing chemical mechanical polishing and planarization processes and for machines performing post-chemical mechanical polishing and planarization processes in the manufacture of semiconductor and microelectronic products