BASIC

Defect repair machines for photomasks for semiconductors; defect repair machines for reticles for semiconductors; foreign matter removal machines for photomasks for semiconductors; foreign matter removal machines for reticles for semiconductors

Semiconductor photomask optical inspection apparatus; semiconductor photomask pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor photomask pattern; semiconductor reticle optical inspection apparatus; semiconductor reticle pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor reticle pattern