BASELINER
Mark Identification

BASELINER

Serial Number

79084612

Filing Date

Jan 26, 2010

Registration Date

May 31, 2011

Trademark by

ASML NETHERLANDS B.V.

Active Trademark

Classification Information

Machines for micro-lithography, namely, machines for manufacturing semiconductors; machines for use in industry in the field of electronics, integrated circuits, semi-conductors, magnetic domain memory and integrated optical systems industries, namely, machines for manufacturing integrated circuits, semi-conductors, magnetic domain memories and optical devices; parts of the aforesaid goods, namely, etching lasers for semiconductor manufacturing machines

Machinery

Microlithography equipment, namely, electronic products for measuring silicon wafers; apparatus and instruments for use in industry in the field of micro-lithography, namely, optical apparatus for inspection and testing for semiconductor wafers and photomasks; software for use in industry in the field of electronics, micro-lithography, semi-conductors, integrated circuits, magnetic domain memory and integrated optical systems industries, namely, for operation of microlithography machines, for designing semiconductors, integrated circuits and magnetic domain memories and for calculating manufacturing parameters; software for the design, testing and fabrication of photo-lithographic masks; semiconductors; integrated circuits; photo-lithographic masks; magnetic heads, namely, electric and magnetic contacts for integrated circuit testers; semiconductor chips

Electrical and Scientific Apparatus

[ Technical consultancy in relation to the engineering of machines, apparatus and instruments for use in industry in the field of electronics, micro-lithography, semi-conductors, integrated circuits, magnetic domain memories and integrated optical systems industries; design, maintenance and development of computer software for use in industry in the field of electronics, micro-lithography, semi-conductors, integrated circuits, magnetic domain memories and integrated optical systems industries and for the design, testing and manufacture of photo-lithographic masks ]

Computer and Scientific