88510050
Jul 11, 2019
May 4, 2021
Active Trademark
Chemical source materials for the use in deposition systems for the deposition of thin films upon semiconductor wafers, semiconductor chips, optical components, and nanotechnology components in the manufacture of semi-conductors, computer peripherals, microscopy equipment, imaging equipment, interferometer instruments, optical instruments, light emitting diode displays, monitors and screens, liquid crystal displays, monitors and screens, batteries, photovoltaic devices, with the aforementioned chemical materials being derived from metals, non-metals, ceramics, oxides, nitrides, organic compounds and polymers
ChemicalsPhysical and chemical vapor deposition systems, namely, coating application machines used for sputter deposition, electron beam evaporation, thermal evaporation, ion beam deposition, ion beam sputter deposition, ion assisted deposition, pulsed laser deposition, and atomic layer deposition; vacuum equipment and systems comprised of vacuum machinery and vacuum pumps used for thin film deposition, etching and cleaning; deposition system components being parts of deposition machinery, namely, substrate tables, fixturing and carriers, thermal evaporation sources, namely, deposition boats, deposition filaments and crucibles, magnetron sputter sources, electron beam evaporators, nanoparticle generators, ion generators, ion accelerators, charged particle generators for material coating and surface modification purposes, sample handling arms and robots, load lock chambers, thin film thickness measurement equipment, optical measurement equipment, process gas delivery and abatement equipment, vacuum valves, vacuum pumps and pumping systems; vacuum equipment and systems comprised of vacuum machinery and vacuum pumps for use in controlled environment and space simulation
MachineryManufacturing of physical and chemical vapor deposition machinery systems to the order and specification of others; manufacturing vacuum equipment and systems used for thin film deposition, etching and cleaning to the order and specification of others; manufacturing vacuum equipment and systems used for controlled environment and space simulation to the order and specification of others
Treatment of MaterialsEngineering services in the field of physical and chemical vapor deposition systems; engineering services in the field of vacuum equipment and systems used for thin film deposition, etching and cleaning; mechanical and chemical engineering services; engineering services in the field of vacuum equipment and systems used for controlled environment and space simulation; design and development of physical and chemical vapor deposition machinery systems; design and development of vacuum equipment and machinery systems used for thin film deposition, etching and cleaning; design and development of vacuum equipment and machinery systems used for controlled environment and space simulation
Computer and Scientific