Gases for welding; Surfactants for use in the manufacture of synthetic detergents; Nitrogen compounds; Nitrogen oxides; Fuel injection cleaner chemical additive; Anti-static preparations for industrial purposes; Etchants for use in the manufacture of semiconductors; Etchants for use in the manufacture of printed circuit boards; Chemical oxidants for use in the manufacture of printed circuits; Antioxidants for use in the manufacture of cosmetics; Chemical source material for the deposition of thin films upon semiconductor wafers for the manufacture of semiconductors